Problem NO: 10

The surface of a silicon wafer is thermally oxidized, resulting in a SiO2 film that is 100 nm thick. If\nthe starting thickness of the wafer was exactl

The surface of a silicon wafer is thermally oxidized, resulting in a SiO2 film that is 100 nm thick. If

\r\n

the starting thickness of the wafer was exactly 0.400 mm, what is the final wafer thickness after

\r\n

thermal oxidation?

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