The surface of a silicon wafer is thermally oxidized, resulting in a SiO2 film that is 100 nm thick. If\nthe starting thickness of the wafer was exactl
The surface of a silicon wafer is thermally oxidized, resulting in a SiO2 film that is 100 nm thick. If
\r\nthe starting thickness of the wafer was exactly 0.400 mm, what is the final wafer thickness after
\r\nthermal oxidation?